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Filtering by: Creator Christopher Liman Resource type Article

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Using Field-Induced Oxides as a Negative Resist in Bromostyrene and Octadecene Hydrosilylation Reactions

Description:

A self-assembled monolayer of an alkene or alkyne can be applied to a hydrogenpassivated silicon surface using UV hydrosilylation. This research shows that field-induced oxides can be used as a negative resist to selectively prevent bromostyrene attachment, providing a means of nanopatterning organic molecules on silicon. The negative resist effects...

Keyword:

Volume 5

Creator:

Christopher Liman

Owner:

Scholarly Digital Publishing

Date Uploaded:

07/19/2018

Date Modified:

07/19/2018

Date Created:

2008

Resource Type:

Article