Carbon nanotubes (CNTs) are highly promising in the miniaturization of electronic devices. However, there are currently many limitations in mass producing devices that involve the application of CNTs, one of which is the ability to physically pattern CNTs in specific locations on a wafer, which is what this study aims to address. Typically, dip-pen nanolithography (DPN) or microcontact printing is used to pattern CNTs (16- mercaptohexadecanoic acid [MHA]) on a gold substrate; however, this gold adds an additional conductive layer in the design of circuits. This study demonstrates that it is possible to pattern MHA, and thus CNTs, directly on a silicon nitride substrate (this method should in theory work similarly on other hydrophilic substrates such as silicon dioxide). This shows that there is the potential to use photolithographic methods such as liftoff to pattern CNTs directly on nitride, eliminating the need for the conductive gold layer and potentially simplifying the circuit design process. 

Last modified

• 07/18/2018

Creator

• Pooja Shaw

DOI

• https://doi.org/10.21985/N27Q66

Keyword

• Volume 4

Date created

• 2007

Resource type

• Article

Rights statement

• In Copyright