Northwestern University

Parent Unit Name

Login

LIBRARIES | ARCH

Menu Search

Start Over

Filtering by: Creator Rajiv Basu Creator Mark C. Hersam

1 entry found

List Gallery Masonry Slideshow

Extending Feedback-Controlled Lithography to Ambient Conditions

Description:

Feedback-controlled lithography (FCL) enables atomically precise patterning of individual molecules on the technologically significant Si(100)-2 x 1:H surface. However, because it is performed in an ultrahigh vacuum (UHV) environment, FCL has thus far been restricted to surface chemistries that can be delivered in the gas phase. The present research attempts...

Keyword:

Volume 1

Creator:

Andrew Baluch, Rajiv Basu, Nathan Guisinger, and Mark C. Hersam

Owner:

Scholarly Digital Publishing

Date Uploaded:

07/12/2018

Date Modified:

07/12/2018

Date Created:

2004

Resource Type:

Article