Stability Study of Self-Assembled Monolayers on Silicon (111)Public Deposited
Monolayers on H-Si(111) were formed thermally using decene and 10-bromodecene. Samples were subjected to 100 percent humidity in order to induce oxidation for upwards of three weeks. The ability of bromine to bind to the Si(111) and inhibit oxidation through steric hindrance was intended to be analyzed. Atomic force microscopy (AFM), x-ray reflectivity (XRR), and x-ray photoelectron spectroscopy (XPS) were used to help characterize the monolayers and to compare the amounts of oxidation. AFM showed the step formation that is characteristic of H-Si(111), and oxidation could also be seen. When XRR was used to determine the physical characteristics of the monolayer, including the height, surface roughness, monolayer and silicon interface roughness, and chain packing density, it showed that the decene monolayer formed, but the 10-bromodecene monolayer did not. Measurements taken using XPS showed that the relative amounts of carbon absorbed to the surface increased over a period of 19 days, with a thin physisorbed monolayer forming from adventitious hydrocarbons present in the air. Lastly, it was seen that the decene monolayer on Si(111) inhibited oxidation.