The formation of organic layers on hydrogen-passivated silicon (HPS) surfaces via (UV) ultraviolet treatment was completed for three styrene derivatives with different conjugated lengths. The styrene molecules were synthesized and characterized using nuclear magnetic resonance (NMR) spectroscopy and gas chromatography-mass spectrometry (GC-MS). Layer formation on silicon was then accomplished through the UV irradiation (254 nm) of an HPS surface that had been immersed in a benzene solution of the respective styrene derivatives. NMR and GC-MS were then employed to ascertain that the styrenic molecules still retained their original purity after UV treatment. X-ray photoelectron spectroscopy (XPS) was used to determine the chemical composition and elemental ratio (qualitative and quantitative analysis) of the organic layers on the silicon surfaces. The treatment of HPS with styrenes can serve as a promising method for the formation of covalently attached organic layers on silicon surfaces that can be subsequently modified for interfacing with biologically important molecules.

Last modified

• 07/23/2018

Creator

• Jun-Hyun Kim
• Rina Verma
• SonBinh T. Nguyen

DOI

• https://doi.org/10.21985/N23T47

Keyword

• Volume 6

Date created

• 2009

Resource type

• Article

Rights statement

• In Copyright