Selective Chemistry on Scanning Probe-Patterned Silicon SurfacesPublic Deposited
This research project explores two different processes that can be used to pattern organic molecules on silicon. In the first process, hydrogen-terminated silicon surfaces were anodized in nanometer scale with a contact-mode atomic force microscope (AFM). Anodization was done by applying a positive bias voltage to the surface with respect to a conducting cantilever. Following anodization, patterned areas were selectively modified by allyltrichlorosilane. Ring Opening Metathesis Polymerization (ROMP) was then performed on the modified patterned areas in order to observe selective deposition of a norbornene polymer. Tapping mode AFM was used to image and quantify the selectively patterned substrate. In the second process, an organosilane monolayer was formed from a precursor vapor IPTMS onto the surface of silicon oxide. IPTMS has been shown to behave as an adequate linker between SiOx and proteins. X-ray photoelectron spectroscopy (XPS) was used to determine the relative extent of silanization of IPTMS on the SiOx substrate. Tapping mode AFM was used to image surface topography.