Using Field-Induced Oxides as a Negative Resist in Bromostyrene and Octadecene Hydrosilylation Reactions

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A self-assembled monolayer of an alkene or alkyne can be applied to a hydrogenpassivated silicon surface using UV hydrosilylation. This research shows that field-induced oxides can be used as a negative resist to selectively prevent bromostyrene attachment, providing a means of nanopatterning organic molecules on silicon. The negative resist effects were confirmed using AFM topography, lateral force microscopy, and secondary ion mass spectrometry. Evidence suggests that field-induced oxides also selectively replace bromostyrene on silicon. An attempt to apply a similar monolayer with octadecene was inconclusive.

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  • 07/19/2018
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