Feedback-controlled lithography (FCL)
enables atomically precise patterning of
individual molecules on the technologically
significant Si(100)-2 x 1:H surface. However,
because it is performed in an ultrahigh vacuum
(UHV) environment, FCL has thus far
been restricted to surface chemistries that
can be delivered in the gas phase. The present
research attempts...
This research project explores two different
processes that can be used to pattern
organic molecules on silicon. In the first
process, hydrogen-terminated silicon surfaces
were anodized in nanometer scale with
a contact-mode atomic force microscope
(AFM). Anodization was done by applying a
positive bias voltage to the surface with
respect...